Invention Application
- Patent Title: STRUCTURE OF GAS SENSOR
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Application No.: US15493120Application Date: 2017-04-20
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Publication No.: US20180306738A1Publication Date: 2018-10-25
- Inventor: Chia-Wei LEE , Chang-Sheng HSU , Chih-Fan HU , Chin-Jen CHENG , Chang Hsin WU
- Applicant: UNITED MICROELECTRONICS CORPORATION
- Main IPC: G01N27/12
- IPC: G01N27/12

Abstract:
The present invention provides a structure of a gas sensor, comprising: a support, having a front side, a back side opposite to the front side, a cell region, and a peripheral region circling the cell region; a cavity, formed on the back side of the support in the cell region; a heater, disposed on the front side of the support covering the cavity; a sensing element, disposed on the heater; and a sealing layer, formed on the back side of the support covering inside the cavity.
Public/Granted literature
- US10408780B2 Structure of gas sensor Public/Granted day:2019-09-10
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