Invention Application
- Patent Title: SPARSE LASER ETCH ANODIZED SURFACE FOR COSMETIC GROUNDING
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Application No.: US16409455Application Date: 2019-05-10
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Publication No.: US20200100349A1Publication Date: 2020-03-26
- Inventor: Rhett D. Gentile , Peter N. Jeziorek , Sunita Venkatesh , Lauren M. Farrell , Steven J. Osborne
- Applicant: Apple Inc.
- Main IPC: H05F3/02
- IPC: H05F3/02 ; H05K5/00 ; H05K5/02

Abstract:
A aesthetically appealing mounting system for an electronic device capable of forming a semi-conductive path for electro-static discharge. The mounting system can include an electrically conductive layer covered by a cosmetic anodized layer with multiple micro-perforations formed through the anodized layer exposing a small portion of the electrically conductive layer. The micro-perforations can be formed by laser-etching the cosmetic anodized layer to provide a grounding path while the micro-perforations remain visually undetectable. A semi-conductive wear layer can be configured to couple with the anodized layer. In some embodiments, the semi-conductive wear layer is in a recess on an electronic device. In some embodiments, the semi-conductive wear layer is comprised of a conformal conductive rubber.
Public/Granted literature
- US10999917B2 Sparse laser etch anodized surface for cosmetic grounding Public/Granted day:2021-05-04
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