Invention Application
- Patent Title: SUBSTRATE HOLDER FOR USE IN A LITHOGRAPHIC APPARATUS AND A METHOD OF MANUFACTURING A SUBSTRATE HOLDER
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Application No.: US17418719Application Date: 2019-11-29
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Publication No.: US20220082945A1Publication Date: 2022-03-17
- Inventor: Andrey NIKIPELOV , Antonius Franciscus Johannes DE GROOT , Mariya NEKLYUDOVA
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- International Application: PCT/EP2019/083027 WO 20191129
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A method of producing a substrate holder for use in a lithographic apparatus, the substrate holder comprising a main body having a main body surface, wherein the method includes the steps of: coating at least part of the main body with a layer of a first coating material; and treating a plurality of discrete regions of the first coating material with laser irradiation to selectively convert said first coating material in said regions to a second coating material having a different structure or density.
Information query
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