Invention Application
- Patent Title: SYSTEM FOR MONITORING A PLASMA
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Application No.: US17583799Application Date: 2022-01-25
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Publication No.: US20220151052A1Publication Date: 2022-05-12
- Inventor: Michael Anthony Purvis , Klaus Martin Hummler , Chengyuan Ding , Robert Jay Rafac , Igor Vladimirovich Fomenkov
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G03F7/20

Abstract:
An amplified optical beam is provided to a region that receives a target including target material, an interaction between the amplified optical beam and the target converting at least some of the target material from a first form to a second form to form a light-emitting plasma; first data comprising information related to the amplified optical beam is accessed; second data comprising information related to the light-emitting plasma is accessed; and an amount of the target material converted from the first form to the second form is determined. The determination is based on at least the first data and the second data, and the second form of the target material is less dense than the first form of the target material.
Public/Granted literature
- US12171053B2 System for monitoring a plasma Public/Granted day:2024-12-17
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