Invention Application
- Patent Title: FLOW RATE CONTROL DEVICE WITH COMPLIANT STRUCTURE
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Application No.: US17528365Application Date: 2021-11-17
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Publication No.: US20220163982A1Publication Date: 2022-05-26
- Inventor: Kwang Kun Park , Jun Seong Lee , Kee Joo Lee
- Applicant: Korea Aerospace Research Institute
- Applicant Address: KR Daejeon
- Assignee: Korea Aerospace Research Institute
- Current Assignee: Korea Aerospace Research Institute
- Current Assignee Address: KR Daejeon
- Priority: KR10-2020-0156225 20201120
- Main IPC: G05D7/01
- IPC: G05D7/01 ; F02K9/60

Abstract:
The flow rate control device includes a main plate corresponding to an inner diameter and including a through hole which is formed at the center thereof and through which a fluid flows, a sub-plate corresponding to a size of the through hole, disposed in front of the main plate, and applied with a pressure of the flowing fluid, and an expansion and contraction flow path formed to connect the through hole and a circumference of the sub-plate to each other and expanded and contracted by the pressure applied to the sub-plate. The expansion and contraction flow path includes a plurality of holes which are formed in a side surface thereof and through which the flow flows, and has a cross-sectional area changed by the pressure to control a flow rate.
Public/Granted literature
- US11927974B2 Flow rate control device with compliant structure Public/Granted day:2024-03-12
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