Invention Application
- Patent Title: LASER SYSTEM FOR SOURCE MATERIAL CONDITIONING IN AN EUV LIGHT SOURCE
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Application No.: US17433007Application Date: 2020-03-02
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Publication No.: US20220192000A1Publication Date: 2022-06-16
- Inventor: Igor Vladimirovich Fomenkov , Yezheng Tao , Robert Jay Rafac
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- International Application: PCT/EP2020/055452 WO 20200302
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G02F1/01 ; G03F7/20
Abstract:
Disclosed is an apparatus and a method in which multiple, e.g., two or more pulses from a single laser source are applied to source material prior to application of a main ionizing pulse in which the multiple pulses are generated by a common laser source. The first pulse is directed towards the source material when the source material is at a first position and the second pulse is directed towards the source material when the source material is at a second position.
Information query
