Invention Application
- Patent Title: DEVICE FOR MEASURING PLASMA ION DENSITY AND APPARATUS FOR DIAGNOSING PLASMA USING THE SAME
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Application No.: US17222937Application Date: 2021-04-05
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Publication No.: US20220270852A1Publication Date: 2022-08-25
- Inventor: Hyo Chang LEE , Jung Hyung KIM , Hee Jung YEOM
- Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE
- Applicant Address: KR Daejeon
- Assignee: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE
- Current Assignee: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE
- Current Assignee Address: KR Daejeon
- Priority: KR10-2021-0022899 20210219
- Main IPC: H01J37/32
- IPC: H01J37/32

Abstract:
Disclosed herein is a device for measuring a plasma ion density, which includes a transceiver antenna configured to apply and receive a microwave, of which a frequency is varied, to and from plasma, and a frequency analyzer configured to analyze a frequency of the microwave received from the transceiver antenna and measure a cut-off frequency, wherein the frequency of the microwave applied to the plasma is varied in the range of 100 kHz to 500 MHz.
Public/Granted literature
- US11735397B2 Device for measuring plasma ion density and apparatus for diagnosing plasma using the same Public/Granted day:2023-08-22
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