Invention Application
- Patent Title: RESIN COMPOSITION
-
Application No.: US17633318Application Date: 2020-09-08
-
Publication No.: US20220289904A1Publication Date: 2022-09-15
- Inventor: Akihiro ONOUE , Tadanori YOSHIMURA , Takahiro NORO
- Applicant: KAO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: KAO CORPORATION
- Current Assignee: KAO CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2019-164904 20190910
- International Application: PCT/JP2020/033929 WO 20200908
- Main IPC: C08G63/688
- IPC: C08G63/688 ; C08K5/42

Abstract:
The present invention is a resin composition, including: a resin α1 having an aromatic dicarboxylic acid monomer unit A1 having a hydrophilic group, a dicarboxylic acid monomer unit B1 having no hydrophilic group, and an aromatic monomer unit C1; and a resin α2 having an aromatic dicarboxylic acid monomer unit A2 having a hydrophilic group, a dicarboxylic acid monomer unit B2 having no hydrophilic group, and an aliphatic monomer unit C2, wherein the resin α2 includes a monomer unit other than a monomer unit that constitutes the resin α1, and a mass ratio of a content of the resin α1 to a content of the resin α2 is 0.9 or more and 20 or less. According to the present invention, a resin composition that can be removed only with water while maintaining the heat resistance of polymer materials can be provided.
Information query