Invention Application
- Patent Title: EVAPORATION SOURCE COOLING MECHANISM
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Application No.: US17706181Application Date: 2022-03-28
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Publication No.: US20220333231A1Publication Date: 2022-10-20
- Inventor: Sambhu KUNDU , PrasannaKalleshwara Buddappa RAMACHANDRAPPA , Sumedh Dattatraya ACHARYA , Subramanya P. HERLE , Nilesh Chimanrao BAGUL , Visweswaren SIVARAMAKRISHNAN
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: C23C14/24
- IPC: C23C14/24 ; C23C14/54

Abstract:
A method, system, and evaporation source for reactive deposition is provided. The system includes a deposition surface operable for depositing a material onto a substrate provided on the deposition surface. The system further includes an evaporation source positioned for depositing the material onto the substrate. The evaporation source includes a crucible. The crucible includes a base and at least one sidewall extending upward from the base and defining an interior region of the crucible. The evaporation source further includes a cooling mechanism. The cooling mechanism includes a cylindrical cooling jacket surrounding an outer surface of the at least one sidewall while leaving a bottom surface of the base exposed, wherein a cooling gap is defined between the outer surface of the at least one sidewall of the crucible and an inner surface of a sidewall of the cylindrical cooling jacket.
Information query
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