• Patent Title: SEMICONDUCTOR DEVICE MANUFACTURING DEVICE AND MANUFACTURING METHOD
  • Application No.: US17642951
    Application Date: 2021-04-16
  • Publication No.: US20220336256A1
    Publication Date: 2022-10-20
  • Inventor: Makoto TAKAHASHI
  • Applicant: SHINKAWA LTD.
  • Applicant Address: JP Tokyo
  • Assignee: SHINKAWA LTD.
  • Current Assignee: SHINKAWA LTD.
  • Current Assignee Address: JP Tokyo
  • Priority: JP2020-082427 20200508
  • International Application: PCT/JP2021/015681 WO 20210416
  • Main IPC: H01L21/683
  • IPC: H01L21/683 B25J15/06 B65G47/91
SEMICONDUCTOR DEVICE MANUFACTURING DEVICE AND MANUFACTURING METHOD
Abstract:
This semiconductor device manufacturing device comprises: a stage; a bonding head; a copying mechanism provided on the bonding head; and a controller that executes the copying process to adjust a facing surface to be parallel to a reference plane by having the facing surface, which is a holding surface or a chip end face, follow the reference plane 110, which is a planar surface of the stage or a substrate. In the copying process, the controller moves the bonding head relative to the surface direction of the reference plane with the facing surface left abutting the reference plane in a state with the copying mechanism switched to a free state, until the axial direction position of the bonding head reaches a stipulated reference position, and when the axial direction position reaches the reference position, switches the copying mechanism to a locked state.
Information query
Patent Agency Ranking
0/0