Invention Application
- Patent Title: METHOD OF INDUCING CRYSTALLIZATION OF CHALCOGENIDE PHASE-CHANGE MATERIAL AND APPLICATION THEREOF
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Application No.: US17842800Application Date: 2022-06-17
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Publication No.: US20220336743A1Publication Date: 2022-10-20
- Inventor: Hao TONG , Ruizhe ZHAO , Xiangshui MIAO
- Applicant: HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY
- Applicant Address: CN Hubei
- Assignee: HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY
- Current Assignee: HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY
- Current Assignee Address: CN Hubei
- Priority: CN202110397929.2 20210414,CN202111161468.5 20210930
- Main IPC: H01L45/00
- IPC: H01L45/00

Abstract:
The disclosure belongs to the field of microelectronics, and specifically, relates to a method of inducing crystallization of a chalcogenide phase-change material and application thereof. To be specific, a dielectric material is brought into contact with an interface of the chalcogenide phase-change material. The dielectric material is in an octahedral configuration, and the dielectric material provides a crystal nucleus growth center for the crystallization of the chalcogenide phase-change material at the interface between the two, so as to induce the phase-change material to accelerate the crystallization. The method is further applied in a phase-change memory cell. Among all the dielectric material layers in contact with the chalcogenide phase-change material layer, the dielectric material structure of at least one side of the dielectric material layer is an octahedral configuration.
Information query
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