Invention Application
- Patent Title: MICROMIRROR ARRAYS
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Application No.: US17634023Application Date: 2020-08-05
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Publication No.: US20220342199A1Publication Date: 2022-10-27
- Inventor: Alexandre HALBACH , Nitesh PANDEY , Sebastianus Adrianus GOORDEN , Veronique ROCHUS , Luc Roger Simonne HASPESLAGH , Guilherme BRONDANI TORRI
- Applicant: ASML NETHERLANDS B.V. , IMEC v.z.w.
- Applicant Address: NL Veldhoven; BE Leuven
- Assignee: ASML NETHERLANDS B.V.,IMEC v.z.w.
- Current Assignee: ASML NETHERLANDS B.V.,IMEC v.z.w.
- Current Assignee Address: NL Veldhoven; BE Leuven
- Priority: EP19192294.7 20190819,EP19199722.0 20190926
- International Application: PCT/EP2020/072006 WO 20200805
- Main IPC: G02B26/08
- IPC: G02B26/08 ; G03F7/20

Abstract:
A micromirror array includes a substrate, a plurality of mirrors for reflecting incident radiation, and for each mirror of the plurality of mirrors, a respective post connecting the substrate to the respective mirror. The micromirror array further includes, for each mirror of the plurality of mirrors, one or more electrostatic actuators connected to the substrate for applying force to the respective post to displace the respective post relative to the substrate, thereby displacing the respective mirror. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection apparatus.
Public/Granted literature
- US12259546B2 Micromirror arrays Public/Granted day:2025-03-25
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