Invention Application
- Patent Title: METHOD AND SYSTEM FOR PREDICTING PROCESS INFORMATION WITH A PARAMETERIZED MODEL
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Application No.: US17780960Application Date: 2020-09-28
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Publication No.: US20230004096A1Publication Date: 2023-01-05
- Inventor: Scott Anderson MIDDLEBROOKS , Patrick WARNAAR , Patrick Philipp HELFENSTEIN , Alexander Prasetya KONIJNENBERG , Maxim PISARENCO , Markus Gerardus Martinus Maria VAN KRAAIJ
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP19212419.6 20191129,EP20151169.8 20200110
- International Application: PCT/EP2020/077115 WO 20200928
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G06V10/82 ; G06N3/08

Abstract:
A method and system for predicting complex electric field images with a parameterized model are described. A latent space representation of a complex electric field image is determined based on dimensional data in a latent space of the parameterized model for a given input to the parameterized model. The given input may be a measured amplitude (e.g., intensity) associated with the complex electric field image. The complex electric field image is predicted based on the latent space representation of the complex electric field image. The predicted complex electric field image includes an amplitude and a phase. The parameterized model comprises encoder-decoder architecture. In some embodiments, determining the latent space representation of the electric field image comprises minimizing a function constrained by a set of electric field images that could be predicted by the parameterized model based on the dimensional data in the latent space and the given input.
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