Invention Application
- Patent Title: SURFACE ACOUSTIC WAVE DEVICE AND METHOD FOR FABRICATING THE SAME
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Application No.: US17393384Application Date: 2021-08-03
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Publication No.: US20230009805A1Publication Date: 2023-01-12
- Inventor: Shih-Hung Tsai , Hon-Huei Liu , Chun-Hsien Lin
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsin-Chu City
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu City
- Priority: CN202110771313.7 20210708
- Main IPC: H03H9/05
- IPC: H03H9/05 ; H03H3/08 ; H03H9/02

Abstract:
A method for fabricating a surface acoustic wave (SAW) device includes the steps of forming a first dielectric layer on a substrate, forming a piezoelectric layer on the first dielectric layer, forming a second dielectric layer on the piezoelectric layer, performing a photo-etching process to remove the second dielectric layer for forming a recess in the second dielectric layer, forming a metal layer in the recess, and then performing a planarizing process to remove the metal layer for forming an electrode in the recess.
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