Invention Application
- Patent Title: SEMICONDUCTOR SUBSTRATE WITH OXIDE SINGLE CRYSTAL HETEROSTRUCTURES, MANUFACTURING METHOD THEREOF AND ELECTRONIC DEVICE USING THE SAME
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Application No.: US17839207Application Date: 2022-06-13
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Publication No.: US20230010061A1Publication Date: 2023-01-12
- Inventor: SEUNG HYUB BAEK , RUIGUANG NING , Jae-Hoon HAN , Byung Chul LEE , Jungho YOON , Hyun-Cheol SONG , Seong Keun KIM , CHONG YUN KANG , Ji-Won CHOI , JIN SANG KIM
- Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
- Applicant Address: KR Seoul
- Assignee: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee Address: KR Seoul
- Priority: KR10-2021-0088485 20210706
- Main IPC: H01L41/313
- IPC: H01L41/313 ; H01L41/08 ; H01L41/187

Abstract:
A semiconductor substrate with oxide single crystal heterostructures, to which a sacrificial layer, an epitaxy functional oxide thin film having a perovskite structure and a metal layer are grown on an oxide single crystal substrate, prepared another metal layer on a semiconductor substrate, and bonded the metal layer of the oxide single crystal substrate to the metal layer of the semiconductor substrate to be face each other, and separated the oxide single crystal substrate by selectively etching and removing only the sacrificial layer after the bonding.
Information query
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