SEMICONDUCTOR SUBSTRATE WITH OXIDE SINGLE CRYSTAL HETEROSTRUCTURES, MANUFACTURING METHOD THEREOF AND ELECTRONIC DEVICE USING THE SAME
Abstract:
A semiconductor substrate with oxide single crystal heterostructures, to which a sacrificial layer, an epitaxy functional oxide thin film having a perovskite structure and a metal layer are grown on an oxide single crystal substrate, prepared another metal layer on a semiconductor substrate, and bonded the metal layer of the oxide single crystal substrate to the metal layer of the semiconductor substrate to be face each other, and separated the oxide single crystal substrate by selectively etching and removing only the sacrificial layer after the bonding.
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