Invention Publication
- Patent Title: SURFACE CLEANING WITH DIRECTED HIGH PRESSURE CHEMISTRY
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Application No.: US17541540Application Date: 2021-12-03
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Publication No.: US20230178388A1Publication Date: 2023-06-08
- Inventor: Brian K. Kirkpatrick , Ekaterina A. Mikhaylichenko , Brian J. Brown
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: H01L21/67
- IPC: H01L21/67 ; B08B3/02

Abstract:
Cleaning chambers may include a substrate support having a substrate seating position. The cleaning chambers may include a plurality of fluid nozzles facing the substrate support. Each fluid nozzle of the plurality of fluid nozzles may define a fluid port characterized by a leading edge and a trailing edge. Each fluid nozzle of the plurality of fluid nozzles may be angled relative to the substrate seating position of the substrate support to produce an interior angle of greater than or about 90° at an intersection location across the substrate seating position for a fluid delivered from each fluid nozzle at the leading edge of the fluid port.
Public/Granted literature
- US12027382B2 Surface cleaning with directed high pressure chemistry Public/Granted day:2024-07-02
Information query
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