Invention Application
- Patent Title: A METHOD AND A SYSTEM FOR XRF MARKING AND READING XRF MARKS OF ELECTRONIC SYSTEMS
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Application No.: US17907738Application Date: 2021-03-24
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Publication No.: US20230137779A1Publication Date: 2023-05-04
- Inventor: Nataly TAL , Mor KAPLINSKY , Tehila NAHUM , Hagit SADE , Dana GASPER , Ron DAFNI , Chen NACHMIAS , Michal FIRSTENBERG , Avital TRACHTMAN , Haggai ALON , Nadav YORAN , Tzemah KISLEV
- Applicant: SECURITY MATTERS LTD.
- Applicant Address: IL D.N. Hevel Eilot
- Assignee: SECURITY MATTERS LTD.
- Current Assignee: SECURITY MATTERS LTD.
- Current Assignee Address: IL D.N. Hevel Eilot
- International Application: PCT/IL2021/050324 WO 20210324
- Main IPC: G06K7/10
- IPC: G06K7/10 ; B42D25/373

Abstract:
There are disclosed a method of producing an XRF readable mark, the XRF readable mark and a component comprising thereof. The method comprises providing an XRF marking composition with specific relative concentrations of one or more chemical elements and fabricating a multilayer structure of the XRF readable mark. The relative concentrations are selected such that in response to irradiation of the XRF marking composition by XRF exciting radiation, the XRF marking composition emits an XRF signal indicative of a predetermined XRF signature. Fabricating the multilayer structure comprises implementing an attenuation layer with at least one element exhibiting high absorbance for an XRF exciting radiation and/or an XRF background; and implementing a marking layer comprising said XRF marking composition.
Information query