Invention Publication
- Patent Title: MODIFICATION METHOD OF POLYPHENYLENE ETHER RESIN, LAMINATED FILM COMPOSITE, LAMINATED FILM, AND SUBSTRATE
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Application No.: US18459383Application Date: 2023-08-31
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Publication No.: US20240052098A1Publication Date: 2024-02-15
- Inventor: De WU , Yi WANG , Shuhang LIAO , Junxing SU
- Applicant: Wuhan Choice Technology Co,Ltd
- Applicant Address: CN Wuhan
- Assignee: Wuhan Choice Technology Co,Ltd
- Current Assignee: Wuhan Choice Technology Co,Ltd
- Current Assignee Address: CN Wuhan
- Priority: CN 22109301278 2022.08.04
- Main IPC: C08G65/48
- IPC: C08G65/48 ; C08J5/18 ; C08L71/12 ; C08K7/18

Abstract:
The present disclosure provides a method for modifying a polyphenylene ether resin, a laminated film composite, a laminated film, and a substrate. The method for modifying a polyphenylene ether resin using an indene oligomer to reduce the molecular weight of the polyphenylene ether to obtain an indene oligomer-modified polyphenylene ether resin. The modified polyphenylene ether with a smaller molecular weight has a lower softening point and melting point, a better interfacial adhesion, and can be better adhered to a substrate of an integrated circuit. Meanwhile, because it has a lower dielectric constant and dielectric loss, the dielectric constant and dielectric loss of the substrate can be reduced, thereby solving the technical problem of electric leakage and heat generation caused when the existing polyphenylene ether resin is applied to an integrated circuit when the feature size of the integrated circuit is reduced.
Public/Granted literature
- US12024591B2 Modification method of polyphenylene ether resin, laminated film composite, laminated film, and substrate Public/Granted day:2024-07-02
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