Invention Publication
- Patent Title: THERMALLY CONDUCTIVE COMPOSITION
-
Application No.: US18257056Application Date: 2022-05-24
-
Publication No.: US20240052224A1Publication Date: 2024-02-15
- Inventor: Naoki MINORIKAWA , Hajime FUNAHASHI , Hikaru SATOH , Hajime YUKUTAKE
- Applicant: Resonac Corporation
- Applicant Address: JP Tokyo
- Assignee: Resonac Corporation
- Current Assignee: Resonac Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP 21139034 2021.08.27
- International Application: PCT/JP2022/021189 2022.05.24
- Date entered country: 2023-06-12
- Main IPC: C09K5/14
- IPC: C09K5/14 ; C09C3/00 ; C09C3/12 ; C09C3/08 ; C09C1/40 ; C08K9/06

Abstract:
A thermally conductive composition comprising: a filler; and a polymer component, wherein the filler comprises at least one surface-treated filler selected from the group consisting of the following filler (A) and filler (B):
Filler (A): A filler surface-treated by a chemical vapor deposition method using a siloxane having one SiH group
Filler (B): A filler surface-treated by a chemical vapor deposition method using a siloxane having two or more SiH groups, wherein at least one group selected from the group consisting of an unsubstituted alkyl group having 6 to 20 carbon atoms, an alkyl group having 2 to 20 carbon atoms having a substituent, and a group having a specific structure is further bonded to a silicon atom on a surface of the filler and introduced.
Filler (A): A filler surface-treated by a chemical vapor deposition method using a siloxane having one SiH group
Filler (B): A filler surface-treated by a chemical vapor deposition method using a siloxane having two or more SiH groups, wherein at least one group selected from the group consisting of an unsubstituted alkyl group having 6 to 20 carbon atoms, an alkyl group having 2 to 20 carbon atoms having a substituent, and a group having a specific structure is further bonded to a silicon atom on a surface of the filler and introduced.
Information query