Invention Publication
- Patent Title: SEMICONDUCTOR DEVICE INCLUDING CRACK DETECTION STRUCTURE AND METHOD OF DETECTING PROGRESSIVE CRACK IN SEMICONDUCTOR DEVICE
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Application No.: US18341818Application Date: 2023-06-27
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Publication No.: US20240222205A1Publication Date: 2024-07-04
- Inventor: Chulhee JEON , Sungho PARK , Younggu KANG , Inho LIM
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Priority: KR 20220186658 2022.12.28
- Main IPC: H01L21/66
- IPC: H01L21/66 ; G01R31/28 ; H01L23/58

Abstract:
A semiconductor device includes a semiconductor die, a chip guard ring, a first crack detection structure, a second crack detection structure and a detection controller. The semiconductor die includes a central region in which a semiconductor integrated circuit is arranged and an external region surrounding the central region. The semiconductor device may accelerate a progress of a crack occurring around the first crack detection structure by applying a first power and a second power having a voltage level difference to the first crack detection structure and the second crack detection structure, respectively, in a first phase, may apply a test input signal to the first crack detection structure in a second phase and may determine whether a progressive crack occurs in the central region based on whether a test output signal responding to the test input signal is detected in the second crack detection structure, in the second phase.
Information query
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