Invention Publication
- Patent Title: ELECTRON SOURCE, MANUFACTURING METHOD THEREFOR, AND DEVICE COMPRISING ELECTRON SOURCE
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Application No.: US18294251Application Date: 2022-06-23
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Publication No.: US20240347306A1Publication Date: 2024-10-17
- Inventor: Hiromitsu CHATANI , Daisuke ISHIKAWA , Jie TANG , Tadakatsu OHKUBO , Shuai TANG , Jun UZUHASHI , Kazuhiro HONO
- Applicant: Denka Company Limited , NATIONAL INSTITUTE FOR MATERIALS SCIENCE
- Applicant Address: JP Chuo-ku, Tokyo
- Assignee: Denka Company Limited,NATIONAL INSTITUTE FOR MATERIALS SCIENCE
- Current Assignee: Denka Company Limited,NATIONAL INSTITUTE FOR MATERIALS SCIENCE
- Current Assignee Address: JP Chuo-ku, Tokyo; JP Tsukuba-shi, Ibaraki
- Priority: JP 21129281 2021.08.05
- International Application: PCT/JP2022/025183 2022.06.23
- Date entered country: 2024-02-01
- Main IPC: H01J1/02
- IPC: H01J1/02 ; H01J9/02

Abstract:
A manufacturing method for an electron source according to the present disclosure includes steps of: (A) cutting out a chip from a block of an electron emission material, (B) fixing a first end portion of the chip to a distal end of a support needle, and (C) sharpening a second end portion of the chip. The step (A) includes forming first and second grooves which constitute first and second surfaces of the chip in the block by irradiating a surface of the block with an ion beam. The first end portion of the chip includes the first surface and the second surface with the surfaces forming an angle α of 10 to 90°. The step (B) includes forming a joint between the distal end of the support needle and the first end portion of the chip.
Public/Granted literature
- US12293893B2 Electron source, manufacturing method therefor, and device comprising electron source Public/Granted day:2025-05-06
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