Invention Grant
- Patent Title: Fluorine-containing silica glass
- Patent Title (中): 含氟硅石玻璃
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Application No.: US915562Application Date: 1997-08-21
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Publication No.: US5958809APublication Date: 1999-09-28
- Inventor: Seishi Fujiwara , Hiroyuki Hiraiwa , Kazuhiro Nakagawa , Shouji Yajima , Norio Komine , Hiroki Jinbo
- Applicant: Seishi Fujiwara , Hiroyuki Hiraiwa , Kazuhiro Nakagawa , Shouji Yajima , Norio Komine , Hiroki Jinbo
- Applicant Address: JPX Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JPX Tokyo
- Priority: JPX8-218991 19960821; JPX8-221248 19960822; JPX8-881254 19960822
- Main IPC: C03B8/04
- IPC: C03B8/04 ; C03B19/14 ; C03B37/014 ; C03C3/06 ; C03C4/00 ; G03F7/20 ; C03C13/04
Abstract:
The invention relates to fluorine-containing silica glasses, and methods of their production. The silica glass may be used for an ultraviolet light optical system in which light in a wavelength region of 200 nm or less, such as an ArF (193 nm) excimer laser, is used. The invention also relates to a projection exposure apparatus containing fluorine-containing glass of the invention.
Public/Granted literature
- US4793609A Exercise device Public/Granted day:1988-12-27
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