Invention Grant
US6084673A Lithographic apparatus for step-and-scan imaging of mask pattern with
interferometer mirrors on the mask and wafer holders
失效
用于在掩模和晶片保持器上用干涉仪镜进行掩模图案的步进扫描成像的平版印刷设备
- Patent Title: Lithographic apparatus for step-and-scan imaging of mask pattern with interferometer mirrors on the mask and wafer holders
- Patent Title (中): 用于在掩模和晶片保持器上用干涉仪镜进行掩模图案的步进扫描成像的平版印刷设备
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Application No.: US810793Application Date: 1997-03-04
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Publication No.: US6084673APublication Date: 2000-07-04
- Inventor: Marinus A. Van Den Brink , Alexander Straaijer
- Applicant: Marinus A. Van Den Brink , Alexander Straaijer
- Applicant Address: NLX Veldhoven
- Assignee: ASM Lithography B.V.
- Current Assignee: ASM Lithography B.V.
- Current Assignee Address: NLX Veldhoven
- Priority: EPX96200575 19960304
- Main IPC: G03F7/22
- IPC: G03F7/22 ; G03F7/20 ; G03F9/00 ; H01L21/027 ; G01B9/02
Abstract:
A lithographic projection apparatus for step-and-scan imaging of a mask pattern (c) on a substrate (W) is described. The synchronous movement of the mast (MA) and the substrate (W) during scanning is controlled by means of contactless measuring systems, inter alia, interferometer systems (ISR, ISW), while the measuring faces (R.sub.1,r, R.sub.1,w) associated with these systems are formed by faces of the holders (WH, MH) for the substrate (W) and the mask (MA), so that very accurate measurements are possible.
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