Invention Grant
- Patent Title: Illuminating optical system for use in projecting exposure device
- Patent Title (中): 用于投影曝光装置的照明光学系统
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Application No.: US899898Application Date: 1997-07-24
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Publication No.: US6095667APublication Date: 2000-08-01
- Inventor: Yasuhiro Kamihara , Hitoshi Ohashi
- Applicant: Yasuhiro Kamihara , Hitoshi Ohashi
- Applicant Address: JPX Tokyo
- Assignee: Olympus Optical Co., Ltd.
- Current Assignee: Olympus Optical Co., Ltd.
- Current Assignee Address: JPX Tokyo
- Priority: JPX6-051609 19940323
- Main IPC: G03F7/20
- IPC: G03F7/20 ; F21V5/00
Abstract:
An illuminating optical system for use in a projection exposure device with high utilization efficiency of the light from the light source and capable of easily realizing with simple construction is disclosed. The system comprises a light source, a light flux separating optical system for separating a light flux from the light source, a condenser optical system for leading the light flux separated by the light flux separating optical system on a reticle, and a diffraction optical unit included in the light flux separating optical system and having a linear grating pattern for separating the light flux from the light source into four.
Public/Granted literature
- US5275789A Apparatus for iodination/purification Public/Granted day:1994-01-04
Information query
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