Invention Grant
- Patent Title: Electrode for optical waveguide element
- Patent Title (中): 光波导元件用电极
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Application No.: US09527468Application Date: 2000-03-17
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Publication No.: US06355496B2Publication Date: 2002-03-12
- Inventor: Isao Tsuruma
- Applicant: Isao Tsuruma
- Priority: JP8-284800 19961028
- Main IPC: H01L2100
- IPC: H01L2100

Abstract:
When forming electrodes for an optical waveguide element, a metal film is formed on a surface of a substrate, and openings of predetermined shapes are formed in the metal film. Then proton exchange is carried out on the surface of the substrate with the metal film used as a mask, and optical channel waveguides are thus formed. At least a part of edge portions of the metal film defining the openings is left on the substrate and the metal film is plated with plating metal. The metal film plated with the plating metal is processed into electrodes of predetermined shapes for applying an electric voltage to the optical channel waveguides.
Public/Granted literature
- US20010046722A1 ELECTRODE FOR OPTICAL WAVEGUIDE ELEMENT Public/Granted day:2001-11-29
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