Invention Grant
US06452117B2 Method for filling high aspect ratio via holes in electronic substrates and the resulting holes
失效
用于通过电子基板中的孔填充高纵横比的方法和由此产生的孔
- Patent Title: Method for filling high aspect ratio via holes in electronic substrates and the resulting holes
- Patent Title (中): 用于通过电子基板中的孔填充高纵横比的方法和由此产生的孔
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Application No.: US09871555Application Date: 2001-05-31
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Publication No.: US06452117B2Publication Date: 2002-09-17
- Inventor: Brian Eugene Curcio , Peter Alfred Gruber , Frederic Maurer , Konstantinos I. Papathomas , Mark David Poliks
- Applicant: Brian Eugene Curcio , Peter Alfred Gruber , Frederic Maurer , Konstantinos I. Papathomas , Mark David Poliks
- Main IPC: H01R1204
- IPC: H01R1204

Abstract:
High aspect ratio (5:1-30:1) and small (5 &mgr;m-125 &mgr;m) diameter holes in a dielectric substrate are provided, which are filled with a solidified conductive material, as well as a method of filling such holes using pressure and vacuum. In certain embodiments, the holes are lined with conductive material and/or capped with a conductive material. The invention also contemplates a chip carrier formed by such material.
Public/Granted literature
- US20010027842A1 Method for filling high aspect ratio via holes in electronic substrates and the resulting holes Public/Granted day:2001-10-11
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