• Patent Title: Small spot ellipsometer
  • Application No.: US09779761
    Application Date: 2001-02-08
  • Publication No.: US06515744B2
    Publication Date: 2003-02-04
  • Inventor: Lanhua Wei
  • Applicant: Lanhua Wei
  • Main IPC: G01J400
  • IPC: G01J400
Small spot ellipsometer
Abstract:
An ellipsometer capable of generating a small beam spot is disclosed. The ellipsometer includes a light source for generating a narrow bandwidth probe beam. An analyzer is provided for determining the change in polarization state of the probe beam after interaction with the sample. A lens is provided having a numerical aperture and focal length sufficient to focus the beam to a diameter of less than 20 microns on the sample surface. The lens is formed from a graded index glass wherein the index of refraction varies along its optical axis. The lens is held in a relatively stress free mount to reduce stress birefringence created in the lens due to changes in ambient temperature. The ellipsometer is capable of measuring features on semiconductors having a dimensions as small as 50×50 microns.
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