Invention Grant
- Patent Title: Silica glass article and manufacturing process therefor
- Patent Title (中): 二氧化硅玻璃制品及其制造工艺
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Application No.: US09998328Application Date: 2001-12-03
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Publication No.: US06709997B2Publication Date: 2004-03-23
- Inventor: Akira Urano , Toshio Danzuka , Tatsuhiko Saito , Yasuhiko Shishido , Masaharu Mogi , Michihisa Kyoto
- Applicant: Akira Urano , Toshio Danzuka , Tatsuhiko Saito , Yasuhiko Shishido , Masaharu Mogi , Michihisa Kyoto
- Priority: JPP.9-127285 19970516; JPP.10-86709 19980331; JPP.11-5581 19990112
- Main IPC: C03C1304
- IPC: C03C1304

Abstract:
A process of manufacturing a silica glass article comprising the steps of: (1) irradiating a silica glass article with electromagnetic waves to generate defects therein; and (2) immersing the thus irradiated silica glass article in an atmosphere comprising a hydrogen gas, thereby providing the resulting silica glass article with a characteristic that is effective for preventing it substantially from increasing its absorption within an ultraviolet region due to ultraviolet ray irradiation. Also disclosed are a silica glass article or a glass fiber produced according to the manufacturing process.
Public/Granted literature
- US20020061810A1 Silica glass article and manufacturing process therefor Public/Granted day:2002-05-23
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