Invention Grant
US06737668B2 Method of manufacturing structure with pores and structure with pores 失效
具有毛孔和结构孔的结构的制造方法

  • Patent Title: Method of manufacturing structure with pores and structure with pores
  • Patent Title (中): 具有毛孔和结构孔的结构的制造方法
  • Application No.: US09895464
    Application Date: 2001-07-02
  • Publication No.: US06737668B2
    Publication Date: 2004-05-18
  • Inventor: Tohru DenTatsuya Iwasaki
  • Applicant: Tohru DenTatsuya Iwasaki
  • Priority: JP2000-201366 20000703
  • Main IPC: H01L2906
  • IPC: H01L2906
Method of manufacturing structure with pores and structure with pores
Abstract:
A method of manufacturing a structure with pores which are formed by anodic oxidation and whose layout, pitch, position, direction, shape and the like can be controlled. The method includes the steps of: disposing a lamination film on a substrate, the lamination film being made of insulating layers and a layer to be anodically oxidized and containing aluminum as a main composition; and performing anodic oxidation starting from an end surface of the lamination film to form a plurality of pores having an axis substantially parallel to a surface of the substrate, wherein the layer to be anodically oxidized is sandwiched between the insulating layers, and a projected pattern substantially parallel to the axis of the pore is formed on at least one of the insulating layers at positions between the pores.
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