Invention Grant
- Patent Title: Method to inspect patterns with high resolution photoemission
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Application No.: US10226590Application Date: 2002-08-23
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Publication No.: US06774990B2Publication Date: 2004-08-10
- Inventor: Ted Liang , Alan R. Stivers , Edita Tejnil
- Applicant: Ted Liang , Alan R. Stivers , Edita Tejnil
- Main IPC: G01N2100
- IPC: G01N2100

Abstract:
Inspecting a patterned surface using photoemission of electrons includes selecting materials of the patterned surface, selecting a light source to produce a difference in yield of photoelectrons from the materials, applying the light from the light source to the patterned surface, detecting the emission of photoelectrons from the patterned surface, and inspecting the patterned surface based on the detected photoelectron emissions.
Public/Granted literature
- US20040036862A1 Method to inspect patterns with high resolution photoemission Public/Granted day:2004-02-26
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