Invention Grant
US06780073B2 Method of manufacturing electron-emitting device, electron source and image-forming apparatus, and apparatus of manufacturing electron source 失效
制造电子发射器件,电子源和图像形成装置的方法以及制造电子源的装置

  • Patent Title: Method of manufacturing electron-emitting device, electron source and image-forming apparatus, and apparatus of manufacturing electron source
  • Patent Title (中): 制造电子发射器件,电子源和图像形成装置的方法以及制造电子源的装置
  • Application No.: US10112720
    Application Date: 2002-04-02
  • Publication No.: US06780073B2
    Publication Date: 2004-08-24
  • Inventor: Miki TamuraToshikazu OhnishiKazuhiro Jindai
  • Applicant: Miki TamuraToshikazu OhnishiKazuhiro Jindai
  • Priority: JP11-047803 19990225; JP2000-047625 20000224
  • Main IPC: H01J900
  • IPC: H01J900
Method of manufacturing electron-emitting device, electron source and image-forming apparatus, and apparatus of manufacturing electron source
Abstract:
A method of manufacturing an electron-emitting device includes a process for forming a pair of electric conductors spaced from each other on a substrate, and an activation process for forming a film of carbon or a carbon compound on at least one of the pair of electric conductors. The activation process is sequentially performed within plural containers having different atmospheres.
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