Invention Grant
- Patent Title: Method of manufacturing electron-emitting device, electron source and image-forming apparatus, and apparatus of manufacturing electron source
- Patent Title (中): 制造电子发射器件,电子源和图像形成装置的方法以及制造电子源的装置
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Application No.: US10112720Application Date: 2002-04-02
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Publication No.: US06780073B2Publication Date: 2004-08-24
- Inventor: Miki Tamura , Toshikazu Ohnishi , Kazuhiro Jindai
- Applicant: Miki Tamura , Toshikazu Ohnishi , Kazuhiro Jindai
- Priority: JP11-047803 19990225; JP2000-047625 20000224
- Main IPC: H01J900
- IPC: H01J900

Abstract:
A method of manufacturing an electron-emitting device includes a process for forming a pair of electric conductors spaced from each other on a substrate, and an activation process for forming a film of carbon or a carbon compound on at least one of the pair of electric conductors. The activation process is sequentially performed within plural containers having different atmospheres.
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