Invention Grant
- Patent Title: Method of fabrication of free standing shape memory alloy thin film
- Patent Title (中): 自立式记忆合金薄膜的制造方法
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Application No.: US09902856Application Date: 2001-07-10
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Publication No.: US06790298B2Publication Date: 2004-09-14
- Inventor: A. David Johnson , Vikas Galhotra , Vikas Gupta
- Applicant: A. David Johnson , Vikas Galhotra , Vikas Gupta
- Main IPC: C22C4500
- IPC: C22C4500

Abstract:
Methods of fabricating a free standing thin film of shape memory alloy material, and products made by the methods. A sacrificial layer of a metallic material is deposited onto the surface of a substrate. Then an amorphous shape memory alloy is sputter deposited onto the outer surface of the sacrificial layer. The sacrificial layer is etched away, leaving the thin film free standing, that is separated from the substrate. The thin film is annealed by heating into a crystalline state, with the annealing step carried out either after the film has been separated from the substrate, or while remaining attached to it.
Public/Granted literature
- US20020046783A1 Free standing shape memory alloy thin film and method of fabrication Public/Granted day:2002-04-25
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