Invention Grant
US06797965B2 Charged particle beam apparatus, pattern measuring method, and pattern drawing method
失效
带电粒子束装置,图案测量方法和图案绘制方法
- Patent Title: Charged particle beam apparatus, pattern measuring method, and pattern drawing method
- Patent Title (中): 带电粒子束装置,图案测量方法和图案绘制方法
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Application No.: US10252510Application Date: 2002-09-24
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Publication No.: US06797965B2Publication Date: 2004-09-28
- Inventor: Hideaki Abe
- Applicant: Hideaki Abe
- Priority: JP2001-291223 20010925
- Main IPC: G01J100
- IPC: G01J100

Abstract:
A charged particle beam apparatus includes a charged particle source which generates a charged particle beam, a condenser lens which converges the charged particle beam, a deflector which deflects the charged particle beam to scan a sample with the charged particle beam, an objective lens which converges the charged particle beam on the surface of the sample, a sample position imaginary variation detection part which detects an imaginary variation of a sample position caused by variation of the focal position of the charged particle beam due to variation in the potential of the sample, and a sample position imaginary variation compensation part which compensates for the detected imaginary variation of the sample position.
Public/Granted literature
- US20030075691A1 Charged particle beam apparatus, pattern measuring method and pattern writing method Public/Granted day:2003-04-24
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