Invention Grant
- Patent Title: Method of producing a liquid ejection head
- Patent Title (中): 液体喷射头的制造方法
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Application No.: US10829961Application Date: 2004-04-23
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Publication No.: US06919169B2Publication Date: 2005-07-19
- Inventor: Isao Tsuruma
- Applicant: Isao Tsuruma
- Applicant Address: JP Kanagawa
- Assignee: Fuji Photo Film Co., Ltd.
- Current Assignee: Fuji Photo Film Co., Ltd.
- Current Assignee Address: JP Kanagawa
- Agency: Sughrue Mion, PLLC
- Priority: JP2003-120931 20030425
- Main IPC: B41J2/16
- IPC: B41J2/16 ; B05B1/14 ; B41J2/06 ; G03F7/16

Abstract:
The present invention provides a method of producing a liquid ejection head having a solution guide member protruding on a head substrate. The solution guide member has a sharp-pointed portion protruding from a liquid surface of a flowing solution in which charged particles are dispersed. The solution guide member guides the solution to the sharp-pointed portion such that the solution is ejected from the sharp-pointed portion by an electrostatic force. The method comprises the steps of forming a photosensitive resin layer on the head substrate; molding a convex portion having the sharp-pointed portion on a surface of the formed photosensitive resin layer by pressing a mold member against the surface of the photosensitive resin layer; and exposing a region of the molded convex portion; and developing the exposed photosensitive resin layer to produce the solution guide member provided on the head substrate.
Public/Granted literature
- US20040212661A1 Method of producing a liquid ejection head Public/Granted day:2004-10-28
Information query
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