Invention Grant
- Patent Title: Capacitor device and method of manufacturing the same
- Patent Title (中): 电容器及其制造方法
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Application No.: US10889312Application Date: 2004-07-13
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Publication No.: US07072168B2Publication Date: 2006-07-04
- Inventor: Yasuyoshi Horikawa , Tomoo Yamasaki , Kiyoshi Ooi
- Applicant: Yasuyoshi Horikawa , Tomoo Yamasaki , Kiyoshi Ooi
- Applicant Address: JP Nagano
- Assignee: Shinko Electric Industries Co., Ltd.
- Current Assignee: Shinko Electric Industries Co., Ltd.
- Current Assignee Address: JP Nagano
- Agency: Armstrong, Kratz, Quintos, Hanson & Brooks, LLP
- Priority: JP2003-196357 20030714
- Main IPC: H01G4/005
- IPC: H01G4/005
Abstract:
A capacitor device of the present invention includes a substrate, a float electrode formed on the substrate, a valve metal film formed on the float electrode, a dielectric film formed on the valve metal film by applying an anodic oxidation to a part of the valve metal film, and a pair of electrodes provided in areas overlapping with two different parts of the float electrode on the dielectric film respectively.
Public/Granted literature
- US20050013088A1 Capacitor device and method of manufacturing the same Public/Granted day:2005-01-20
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