Invention Grant
- Patent Title: Use of amorphous carbon film as a hardmask in the fabrication of optical waveguides
- Patent Title (中): 在制造光波导中使用无定形碳膜作为硬掩模
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Application No.: US10799147Application Date: 2004-03-12
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Publication No.: US07079740B2Publication Date: 2006-07-18
- Inventor: Laurent Vandroux , Herve Monchoix
- Applicant: Laurent Vandroux , Herve Monchoix
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson and Sheridan
- Main IPC: G02B6/10
- IPC: G02B6/10

Abstract:
Methods are provided for forming optical devices, such as waveguides, with minimal defect formation. In one aspect, the invention provides a method for forming a waveguide structure on a substrate surface including forming a cladding layer on the substrate surface, forming a core layer on the cladding layer, depositing an amorphous carbon hardmask on the core layer, forming a patterned photoresist layer on the amorphous carbon hardmask, etching the amorphous carbon hardmask, and etching the core material.
Public/Granted literature
- US20050199013A1 Use of amorphous carbon film as a hardmask in the fabrication of optical waveguides Public/Granted day:2005-09-15
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