Invention Grant
- Patent Title: Illumination optical system and exposure apparatus
- Patent Title (中): 照明光学系统和曝光装置
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Application No.: US10769373Application Date: 2004-01-30
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Publication No.: US07110084B2Publication Date: 2006-09-19
- Inventor: Toshihiko Tsuji
- Applicant: Toshihiko Tsuji
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Morgan & Finnegan, LLP
- Priority: JP2003-324636 20030917
- Main IPC: G03B27/42
- IPC: G03B27/42

Abstract:
Attempting to provide an illumination optical system and an exposure apparatus using the same, which provide a more uniform angular distribution of light for illuminating a mask than the prior art, an illumination optical system for illuminating an object surface includes an optical unit that converts light from a light source section into approximately parallel light, and includes first and second mirrors, wherein the first mirror has an opening, through which light reflected by the second mirror passes.
Public/Granted literature
- US20050057738A1 Illumination optical system and exposure apparatus Public/Granted day:2005-03-17
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