Invention Grant
- Patent Title: Method for topographical patterning of a device
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Application No.: US09905037Application Date: 2001-07-13
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Publication No.: US07129179B2Publication Date: 2006-10-31
- Inventor: Zine Eddine Boutaghou
- Applicant: Zine Eddine Boutaghou
- Applicant Address: US CA Scotts Valley
- Assignee: Seagate Technology LLC
- Current Assignee: Seagate Technology LLC
- Current Assignee Address: US CA Scotts Valley
- Main IPC: H01L21/302
- IPC: H01L21/302

Abstract:
The device of the present invention facilitates engaging mating elements, such as actuators used in disc drives, with a pattern on the device. The improved device includes arcuate edges between at least one of the sidewalls in the pattern and the surface of the device. The arcuate edges minimize some of the fracturing of the device that typically occurs when a mating element is inserted on or into the device. The present invention also relates to a method of fabricating a device. The method comprises positioning a mask in the form of a pattern relative to the device, and then etching the pattern into a surface on the device to form at least one sidewall and an arcuate edge such that the arcuate edge extends between the surface on the device and one of the sidewalls.
Public/Granted literature
- US20020135266A1 Method for topographical patterning of a device Public/Granted day:2002-09-26
Information query
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