Invention Grant
- Patent Title: Method for producing silica particles
- Patent Title (中): 二氧化硅粒子的制造方法
-
Application No.: US10169191Application Date: 2000-12-28
-
Publication No.: US07140201B2Publication Date: 2006-11-28
- Inventor: Kunio Sugiyama , Shuichi Tada , Jinichi Omi , Tadahiro Nakada , Hiroshi Morita , Masaki Kusuhara , Hiroyuki Watanabe , Hirofumi Uehara , Keiko Sanpei
- Applicant: Kunio Sugiyama , Shuichi Tada , Jinichi Omi , Tadahiro Nakada , Hiroshi Morita , Masaki Kusuhara , Hiroyuki Watanabe , Hirofumi Uehara , Keiko Sanpei
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: M. Watanabe & Co., Ltd.,Asahi Denka Kogyo Kabushiki Kaisha
- Current Assignee: M. Watanabe & Co., Ltd.,Asahi Denka Kogyo Kabushiki Kaisha
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP11-375206 19991228; JP11-375207 19991228; JP2000-126156 20000426
- International Application: PCT/JP00/09357 WO 20001228
- International Announcement: WO01/47808 WO 20010705
- Main IPC: C03B8/02
- IPC: C03B8/02 ; C01B33/113

Abstract:
A hydrous silica gel is dehydrated by freezing, thawing, and removing water separated by thawing, thereby yielding silica particles. In addition, the silica particles thus formed is washed and fired, thereby producing a synthetic quartz glass power.A water glass is dealkalized, an oxidizing agent and an acid are added, the mixture thus formed is passed through a hydrogen type cation exchange resin, the aqueous silica solution thus formed is then gelled, and the gelled material is then washed and fired, thereby producing a synthetic quartz powder.Silica is sequentially held for a predetermined time at each temperature range of 150 to 400° C., 500 to 700° C., and 1,100 to 1,300° C., thereby producing a quartz glass.
Public/Granted literature
- US20030005724A1 Method for producing silica particles, synthetic quartz powder and synthetic quartz glass Public/Granted day:2003-01-09
Information query