Invention Grant
- Patent Title: Method for reducing defect concentrations in crystals
- Patent Title (中): 降低晶体缺陷浓度的方法
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Application No.: US10455007Application Date: 2003-06-05
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Publication No.: US07175704B2Publication Date: 2007-02-13
- Inventor: Mark Philip D'Evelyn , Thomas Richard Anthony , Stephen Daley Arthur , Lionel Monty Levinson , John William Lucek , Larry Burton Rowland , Suresh Shankarappa Vagarali
- Applicant: Mark Philip D'Evelyn , Thomas Richard Anthony , Stephen Daley Arthur , Lionel Monty Levinson , John William Lucek , Larry Burton Rowland , Suresh Shankarappa Vagarali
- Applicant Address: US OH Worthington
- Assignee: Diamond Innovations, Inc.
- Current Assignee: Diamond Innovations, Inc.
- Current Assignee Address: US OH Worthington
- Agency: Pepper Hamilton LLP
- Main IPC: C30B7/10
- IPC: C30B7/10

Abstract:
A method for removing defects at high pressure and high temperature (HP/HT) or for relieving strain in a non-diamond crystal commences by providing a crystal, which contains defects, and a pressure medium. The crystal and the pressure medium are disposed in a high pressure cell and placed in a high pressure apparatus, for processing under reaction conditions of sufficiently high pressure and high temperature for a time adequate for one or more of removing defects or relieving strain in the single crystal.
Public/Granted literature
- US20040000266A1 Method for reducing defect concentrations in crystals Public/Granted day:2004-01-01
Information query
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