Invention Grant
- Patent Title: Treatment liquid supply system
- Patent Title (中): 处理液供应系统
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Application No.: US10671219Application Date: 2003-09-25
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Publication No.: US07175757B2Publication Date: 2007-02-13
- Inventor: Yuki Hamada , Kay Fujimori
- Applicant: Yuki Hamada , Kay Fujimori
- Applicant Address: JP Tokyo
- Assignee: Fujimori Technical Laboratory Inc.
- Current Assignee: Fujimori Technical Laboratory Inc.
- Current Assignee Address: JP Tokyo
- Agent Lawrence E. Laubscher, Jr.
- Main IPC: B01D33/82
- IPC: B01D33/82 ; B01D17/12 ; B05B7/26 ; B05B7/28 ; B05B7/30

Abstract:
In a treatment liquid supply system that supplies treatment liquid used for coating industrial objects for film formation including a semiconductor substrate, a display substrate, a glass and the like, a nozzle connected to a treatment liquid tank vacuum-sucks and injects the treatment liquid from the treatment liquid tank due to a negative pressure occurring in the nozzle, wherein supply control of a small flow amount of the treatment liquid to the nozzle can be performed due to a difference pressure between pressure in the treatment liquid tank and the negative pressure occurring in the nozzle.
Public/Granted literature
- US20050067334A1 Treatment liquid supply system Public/Granted day:2005-03-31
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