Invention Grant
- Patent Title: Microstructure comprising a surface which is functionalized through the localized deposit of a thin layer and production method thereof
- Patent Title (中): 微结构包括通过薄层的局部沉积而官能化的表面及其制备方法
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Application No.: US10524560Application Date: 2003-08-25
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Publication No.: US07196385B2Publication Date: 2007-03-27
- Inventor: Christophe Bureau , Christophe Kergueris , Francois Perruchot
- Applicant: Christophe Bureau , Christophe Kergueris , Francois Perruchot
- Applicant Address: FR Massy FR Grenoble
- Assignee: Alchimer S.A.,Tronic's Microsystems
- Current Assignee: Alchimer S.A.,Tronic's Microsystems
- Current Assignee Address: FR Massy FR Grenoble
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- Priority: FR0210571 20020826
- International Application: PCT/FR03/50036 WO 20030825
- International Announcement: WO2004/018349 WO 20040304
- Main IPC: H01L29/84
- IPC: H01L29/84 ; H01L21/00
Abstract:
An electromechanical microstructure including a first mechanical part formed in a first electrically conductive material, and which includes a zone deformable in an elastic manner having a thickness value and an exposed surface, and a first organic film having a thickness, present on all of the exposed surface of the deformable zone. The thickness of the first film is such that the elastic response of the deformable zone equipped with the first film does not change by more than 5% compared to the response of the bare deformable zone, or the thickness of the first film is less than ten times the thickness of the deformable zone.
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