Invention Grant
- Patent Title: Method for producing circuit substrate
- Patent Title (中): 电路基板的制造方法
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Application No.: US10910271Application Date: 2004-08-04
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Publication No.: US07244370B2Publication Date: 2007-07-17
- Inventor: Keiichi Sasaki , Masato Kamiichi , Yukihiro Hayakawa , Ershad Ali Chowdhury
- Applicant: Keiichi Sasaki , Masato Kamiichi , Yukihiro Hayakawa , Ershad Ali Chowdhury
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2003-286576 20030805; JP2003-313871 20030905
- Main IPC: G01D15/00
- IPC: G01D15/00 ; G11B5/127 ; H01B13/00

Abstract:
In order to provide a circuit substrate with a satisfactory step coverage by the protective layer and the anti-cavitation film in an edge portion of wirings and a liquid discharge head utilizing such circuit substrate, the invention provides a method for producing a circuit substrate provided, on an insulating surface of a substrate, with a plurality of elements each including a resistive layer and a pair of electrodes formed with a predetermined spacing on said resistive layer, including a step of forming an aluminum electrode wiring layer on the resistive layer, a step of isolating the electrode wiring layer by dry etching into each element, and a step of forming the electrode wiring into a tapered cross section with an etching solution containing phosphoric acid, nitric acid and a chelating agent capable of forming a complex with the wiring metal.
Public/Granted literature
- US20050031996A1 Method for producing circuit substrate Public/Granted day:2005-02-10
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