Invention Grant
US07297965B2 Method and apparatus for sample formation and microanalysis in a vacuum chamber
有权
真空室中样品形成和微量分析的方法和装置
- Patent Title: Method and apparatus for sample formation and microanalysis in a vacuum chamber
- Patent Title (中): 真空室中样品形成和微量分析的方法和装置
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Application No.: US11119207Application Date: 2005-04-28
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Publication No.: US07297965B2Publication Date: 2007-11-20
- Inventor: Eitan Kidron , Dror Shemesh
- Applicant: Eitan Kidron , Dror Shemesh
- Applicant Address: IL Rehovot
- Assignee: Applied Materials, Israel, Ltd.
- Current Assignee: Applied Materials, Israel, Ltd.
- Current Assignee Address: IL Rehovot
- Agent Tarek N. Fahmi
- Main IPC: G21K5/10
- IPC: G21K5/10

Abstract:
Methods and apparatus are disclosed for forming a sample of an object, extracting the sample from the object, and subjecting this sample to microanalysis including surface analysis and electron transparency analysis in a vacuum chamber. In some embodiments, a method is provided for imaging an object cross section surface of an extracted sample. Optionally, the sample is iteratively thinned and imaged within the vacuum chamber. In some embodiments, the sample is situated on a sample support including an optional aperture. Optionally, the sample is situated on a surface of the sample support such that the object cross section surface is substantially parallel to the surface of the sample support. Once mounted on the sample support, the sample is either subjected to microanalysis in the vacuum chamber, or loaded onto a loading station. In some embodiments, the sample is imaged with an electron beam substantially normally incident to the object cross section surface.
Public/Granted literature
- US20060011868A1 Method and apparatus for sample formation and microanalysis in a vacuum chamber Public/Granted day:2006-01-19
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