Invention Grant
US07316602B2 Constant low force wafer carrier for electrochemical mechanical processing and chemical mechanical polishing 失效
用于电化学机械加工和化学机械抛光的恒定低力晶片载体

Constant low force wafer carrier for electrochemical mechanical processing and chemical mechanical polishing
Abstract:
A carrier head for holding a workpiece during processing of a workpiece surface is provided. The carrier head includes a carrier housing, a base and a pressure member. The base is configured to hold the workpiece and is movable with respect to the carrier housing. The pressure member is between the base and the carrier housing and is configured to induce the base to apply a predetermined force onto the process surface.
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