Invention Grant
- Patent Title: Illumination system particularly for microlithography
- Patent Title (中): 照明系统特别适用于微光刻
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Application No.: US11649199Application Date: 2007-01-03
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Publication No.: US07348565B2Publication Date: 2008-03-25
- Inventor: Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
- Applicant: Hans-Juergen Mann , Wolfgang Singer , Joerg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Wilhelm Ulrich
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT AG
- Current Assignee: Carl Zeiss SMT AG
- Current Assignee Address: DE Oberkochen
- Agency: Ohlandt, Greeley, Ruggiero & Perle, L.L.P.
- Priority: DE19819898 19980505; DE19903807 19990202; DE29902108U 19990208; WOPCT/EP00/07258 20000728
- Main IPC: G02B27/14
- IPC: G02B27/14 ; G02B5/30 ; G02B17/00
Abstract:
There is provided a projection exposure apparatus for microlithography using a wavelength less than or equal to 193 nm. The apparatus includes an optical element with a pupil raster element, and a projection objective with a real entrance pupil. The optical element is situated in or near a plane defined by the real entrance pupil.
Public/Granted literature
- US20070120072A1 Illumination system particularly for microlithography Public/Granted day:2007-05-31
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