Invention Grant
- Patent Title: Method and system to compensate for lamp intensity differences in a photolithographic inspection tool
- Patent Title (中): 补偿光刻检测工具灯强度差异的方法和系统
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Application No.: US10749887Application Date: 2003-12-31
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Publication No.: US07359545B2Publication Date: 2008-04-15
- Inventor: David Dixon , Lloyd Lee
- Applicant: David Dixon , Lloyd Lee
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Wood, Herron & Evans, L.L.P.
- Main IPC: G06K9/00
- IPC: G06K9/00

Abstract:
An after develop inspection tool considers tool-to-tool variability when determining confidence score for wafers under inspection. A golden wafer is used to calculate a RGB signature as well as the slope of the individual RGB curves for different lamp intensities. These slopes are normalized in order to generate a compensation factor for red values and blue values within a signature. When a wafer is subsequently inspected at an ADI station using a different lamp, the test wafer RGB signature is likely captured at a different lamp intensity. Consequently, when comparing the signatures, the golden wafer RGB signature is adjusted by the compensation factors, based on the different lamp's intensity setting, and this adjusted RGB signature is then used to determine whether a defect exists on the test wafer.
Public/Granted literature
- US20050146716A1 Method and system to compensate for lamp intensity differences in a photolithographic inspection tool Public/Granted day:2005-07-07
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