Invention Grant
- Patent Title: Method of manufacturing floating structure
- Patent Title (中): 浮动结构制造方法
-
Application No.: US11341613Application Date: 2006-01-30
-
Publication No.: US07361524B2Publication Date: 2008-04-22
- Inventor: Seok-jin Kang
- Applicant: Seok-jin Kang
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2005-0011836 20050214
- Main IPC: H01L21/00
- IPC: H01L21/00
Abstract:
A method of manufacturing a floating structure capable of providing increased device yield. The method includes: a) forming an insulation film, a predetermined area of which is removed, between a first substrate and a second substrate; and b) forming a floating structure in the removed predetermined area.
Public/Granted literature
- US20060183332A1 Method of manufacturing floating structure Public/Granted day:2006-08-17
Information query
IPC分类:
