Invention Grant
- Patent Title: Electron microscope and electron beam inspection system
- Patent Title (中): 电子显微镜和电子束检查系统
-
Application No.: US11180671Application Date: 2005-07-14
-
Publication No.: US07394066B2Publication Date: 2008-07-01
- Inventor: Hisaya Murakoshi , Masaki Hasegawa , Hideo Todokoro
- Applicant: Hisaya Murakoshi , Masaki Hasegawa , Hideo Todokoro
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2004-208871 20040715
- Main IPC: G21K7/00
- IPC: G21K7/00

Abstract:
An electron microscope includes an illuminating lens system that illuminates an electron beam that is emitted from an electron source onto a specimen as a planar illuminating electron beam having a two-dimensional spread, an imaging lens system that projects and magnifies the reflecting electron beam emitted from the specimen to project and form a specimen image, a beam separator that separates the illuminating electron beam from the reflecting electron beam, and a controller. The controller controls the reflecting electron beam so as to go straight through the beam separator, and the illuminating electron beam so as to keep a deflection angle of the illuminating electron beam which is made by the beam separator substantially constant.
Public/Granted literature
- US20060011835A1 Electron microscope and electron beam inspection system Public/Granted day:2006-01-19
Information query