Invention Grant
- Patent Title: Gas discharge lamp for extreme UV radiation
- Patent Title (中): 用于极紫外辐射的气体放电灯
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Application No.: US10536918Application Date: 2003-11-28
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Publication No.: US07397190B2Publication Date: 2008-07-08
- Inventor: Guenther Hans Derra , Joseph Robert Rene Pankert , Willi Neff , Klaus Bergmann , Jeroen Jonkers
- Applicant: Guenther Hans Derra , Joseph Robert Rene Pankert , Willi Neff , Klaus Bergmann , Jeroen Jonkers
- Applicant Address: NL Eindhoven
- Assignee: Koninklijke Philips Electronics, N.V.
- Current Assignee: Koninklijke Philips Electronics, N.V.
- Current Assignee Address: NL Eindhoven
- Priority: DE10256663 20021204
- International Application: PCT/IB03/05496 WO 20031128
- International Announcement: WO2004/051698 WO 20040617
- Main IPC: H01J61/09
- IPC: H01J61/09
Abstract:
The invention relates to a gas discharge lamp for EUV radiation with an anode (1) and a hollow cathode (2), wherein the hollow cathode (2) has at least two openings (3, 3′) and the anode (1) has a through hole (4), which is characterized in that the longitudinal axes (5, 5′) of the hollow cathode openings (3) have a common point of intersection S lying on the axis of symmetry (6) of the anode opening (4).
Public/Granted literature
- US20060138960A1 Gas discharge lamp for euv radiation Public/Granted day:2006-06-29
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